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───     2013 PAPERS     ───

 

1. Improved Leakage and Reliability for ZrLaOx/ZrTiOx/ZrLaOx-Based MIM Capacitors by Plasma Nitridation

Chia-Chun Lin, Yung-Hsien Wu*, Ren-Siang Jiang, Yu-Bo Lin, Meng-Ting Yu, and Cherng-En Sun

IEEE Electron Device Lett., vol. 34, no.7, pp. 915-917, 2013.

 

 

 

 

 

 

 

 

 

 

 

 

2. MIM Capacitors Based on ZrTiOx/BaZryTi1−yO3 Featuring Record-Low VCC and Excellent Reliability

Chia-Chun Lin, Yung-Hsien Wu*, Ren-Siang Jiang, and Meng-Ting Yu

IEEE Electron Device Lett., vol. 34, no. 11, pp. 1418-1420, 2013.

 

 

 

 

 

 

 

 

 

 

 

 

 

3. On the Bipolar Resistive Switching Memory Using TiN/Hf/HfO2/Si MIS Structure

Yung-Hsien Wu*, Dirk J Wouters, Paul Hendrickx, Leqi Zhang, Yang Yin Chen, Ludovic Goux, Andrea Fantini, Guido Groeseneken, and Malgorzata Jurczak

IEEE Electron Device Lett., vol. 34, no. 3, pp. 414-416, 2013.

 

 

 

 

 

 

 

 

 

 

 

 

4. One-Time Programmable Memory Based on ZrTiOx Antifuse for Crossbar Memory Application Featuring High Speed Operation and Low Power Consumption

Chia-Chun Lin and Yung-Hsien Wu*

IEEE Electron Device Lett., vol. 34, no. 12, pp. 1518-1520, 2013.

 

 

 

 

 

 

 

 

 

 

 

5. High quality Ge surface passivation layer formed by thrmal oxidation of Y/Ge structure

Min-Lin Wu, Yung-Hsien Wu*, Rong-Jhe Lyu, Chun-Yen Chao, Chao-Yi Wu, Chia-Chun Lin,and Lun-Lun Chen

Microelectronic Engineering, vol. 109, pp. 216–219, 2013.

 

 

 

 

 

 

 

 

 

 

 

 

6. Crystalline ZrTiO4-Gated Ge Metal–Oxide–Semiconductor Devices With Amorphous Yb2O3 as a Passivation Layer

Min-Lin Wu, Yung-Hsien Wu*, Chun-Yen Chao, Chia-Chun Lin, and Chao-Yi Wu

IEEE Transactions on Nanotechnology, vol. 12, no. 6, pp. 1018-1021, 2013.

 

 

 

 

 

 

 

 

 

 

 

 

 

7. Electrical Characteristics for Flash Memory With Germanium Nitride as the Charge-Trapping Layer

Chia-Chun Lin, Yung-Hsien Wu*, Yuan-Sheng Lin, Min-Lin Wu, and Lun-Lun Chen

IEEE Transactions on Nanotechnology, vol. 12, no. 3, pp. 436-441, 2013.

 

 

 

 

 

 

 

 

 

 

 

 

 

8. Impact of Dielectric Crystallinity on The Resistive Switching Characteristics of ZrTiOx-Based Metal–Insulator-Metal Devices

Chia-Chun Lin, Yung-Hsien Wu*, Tung-Hsuan Hung,and Chin-Yao Hou

Microelectronic Engineering, vol. 109, pp. 374–377, 2013.

 

 

 

 

 

 

 

 

 

 

 

 

 

 

───   2013 CONFERENCE   ───

 

1.Crystalline High-k Dielectrics for Nano Devices

Yung-Hsien Wu*

2013 Energy Materials Nanotechnology East Meeting, Beiging, 2013.

 

2.Impact of Plasma Nitridation on Reliability Performance of MIM Capacitors Based on ZrLaOx/ZrTiOx/ZrLaOx Laminate Insulator

Chia-Chun Lin, Ren-Siang Jiang, Yu-Bo Lin, Meng-Ting Yu, Chern-En Sun, and Yung-Hsien Wu*

In International Conference on Solid State Devices and Materials (SSDM), Fukuoka, Japan, 2013.

 

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